Dual-channel technology with cap-free single metal gate for high performance CMOS in gate-first and gate-last integration
Liesbeth Witters(IMEC), Naoto Horiguchi(IMEC), M. Cho(IMEC), G. Mannaert(IMEC), Hilde Tielens(IMEC), S. Kubicek(IMEC), L.-Å. Ragnarsson(IMEC), S. Brus(University of Liège), Andriy Hikavyy(IMEC), An Steegen(IMEC), Shinji Takeoka(Waseda University), T. Kauerauf(IMEC), K. Devriendt(IMEC), Paola Favia(IMEC), E. Röhr(IMEC), Y. Crabbe(IMEC), Kristof Kellens(IMEC), Geert Hellings(IMEC), J. Franco(KU Leuven), Philippe Roussel(IMEC), H. Bender(IMEC), Geert Eneman(Research Foundation - Flanders), A. Veloso(IMEC), Shimpei Yamaguchi(IMEC), B. Duriez(IMEC), Wenlei Wang(IMEC), M. Fukuda(The University of Osaka), Jérôme Mitard(IMEC), T. Schram(IMEC), K. De Meyer(IMEC), Roger Loo(IMEC)
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