10&#x00D7;10nm<sup>2</sup> Hf/HfO<inf>x</inf> crossbar resistive RAM with excellent performance, reliability and low-energy operation
B. Govoreanu(IMEC), M. Jurczak(IMEC), Dirk J. Wouters(IMEC), Sergiu Clima(IMEC), Paul Hendrickx(IMEC), L. Altimime(IMEC), Iuliana Radu(IMEC), Vasile Paraschiv(IMEC), A. Fantini(IMEC), R. Degraeve(IMEC), Kyung Wook Seo(IMEC), H. Bender(IMEC), Geoffrey Pourtois(IMEC), Gouri Sankar Kar(IMEC), J. A. Kittl(IMEC), Stefan Kubicek(Austrian Academy of Sciences), T. Vandeweyer(IMEC), YY Chen(IMEC), Olivier Richard(IMEC), L. Goux(IMEC), N. Jossart(IMEC)
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