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Low Weibull slope of breakdown distributions in high-k layersT. Kauerauf, G. Groeseneken, R. Degraeve et al.|IEEE Electron Device Letters|2002Cited by 96
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Review of reliability issues in high-k/metal gate stacksR. Degraeve, G. Groeseneken, M. Aoulaiche et al.|Unknown|2008Cited by 65