ALD deposition of high-k and metal gate stacks for advanced CMOS applications
Marc Heyns(IMEC), Wilfried Vandervorst(Imec the Netherlands), Jan Willem Maes(ASM International (Belgium)), W. Deweerd(IMEC), G. Groeseneken(KU Leuven), Annelies Delabie(IMEC), Dong Hwa Kwak, Michel Houssa(IMEC), L. Pantisano(IMEC), Jacob C. Hooker(Northwestern University), Matty Caymax(IMEC), M. Niwa, E. Röhr(IMEC), G.S. Lujan(IMEC), R. Degraeve(IMEC), Stefan De Gendt(Imec the Netherlands), Martine Claes(Imec the Netherlands), S. Beckx(Imec the Netherlands), Sven Van Elshocht(Columbia University), Lars‐Åke Ragnarsson(IMEC), Riikka L. Puurunen(Aalto University), R.J.P. Lander(NXP (Belgium)), T. Schram(IMEC)
Unknown
January 1, 2004
Cited by 0
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