45nm nMOSFET with metal gate on thin SiON driving 1150μA/μm and off-state of 10nA/μK. Henson, S. Biesemans, Olivier Richard et al.|Unknown|2005Cited by 12
NMOS and PMOS triple gate devices with mid-gap metal gate on oxynitride and Hf based gate dielectricsK. Henson, S. Biesemans, Nadine Collaert et al.|Unknown|2005Cited by 8
Selective Wet Removal of Hf-Based Layers and Post-Dry Etch Residues in High-k and Metal Gate StacksMartine Claes, Stefan De Gendt, Vasile Paraschiv et al.|Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena|2005Cited by 1
Integration of high-k gate dielectrics - Wet etch, cleaning and surface conditioningStefan De Gendt, Marc Heyns, S. Beckx et al.|Unknown|2004Cited by 0
ALD deposition of high-k and metal gate stacks for advanced CMOS applicationsMarc Heyns, Wilfried Vandervorst, S. Beckx et al.|Unknown|2004Cited by 0