ALD deposition of high-k and metal gate stacks for advanced CMOS applicationsMarc Heyns, Wilfried Vandervorst, S. Beckx et al.|Unknown|2004Cited by 0
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High-k Dielectrics Integration ProspectsStefan Kubicek, S. Biesemans, Sven Van Elshocht et al.|ECS Meeting Abstracts|2006Cited by 0