Selective epitaxial Si/SiGe growth for<i>V</i><sub>T</sub>shift adjustment in high<i>k</i>pMOS devicesRoger Loo, Matty Caymax, Haruyuki Sorada et al.|Semiconductor Science and Technology|2006Cited by 22
Investigation of poly-Si/HfO/sub 2/ gate stacks in a self-aligned 70nm MOS process flowS. Kubicek, K. De Meyer, S. DeGendt et al.|Unknown|2004Cited by 4
Scaling of high-k dielectrics towards sub-1nm EOTMarc Heyns, D. Pique, S. Beckx et al.|Unknown|2004Cited by 3
High-k Dielectrics Integration ProspectsStefan Kubicek, S. Biesemans, Sven Van Elshocht et al.|ECS Meeting Abstracts|2006Cited by 0
ALD deposition of high-k and metal gate stacks for advanced CMOS applicationsMarc Heyns, Wilfried Vandervorst, S. Beckx et al.|Unknown|2004Cited by 0