Gatestacks for scalable high-performance FinFETs
G. Vellianitis(NXP (Belgium)), Liangzhen Lai(Meta (Israel)), G. Doornbos(Vrije Universiteit Amsterdam), M. Kaiser(Philips (Netherlands)), S. Biesemans(IMEC), M. Jurczak(IMEC), Bartek Pawlak(NXP (Belgium)), M. Demand(IMEC), C. Jonville(NXP (Belgium)), Andriy Hikavyy(IMEC), Frederik Leys(IMEC), A. Delabie(IMEC), Nadine Collaert(IMEC), Christie Delvaux(IMEC), Liesbeth Witters(IMEC), J. Pétry(Service Public Fédéral Économie), C. Torregiani(IMEC), Ray Duffy(NXP (Belgium)), S. Beckx(Imec the Netherlands), S. Mertens(IMEC), G. Curatola(NXP (Belgium)), D.M. Donnet(NXP (Netherlands)), T. Vandeweyer(IMEC), R. Rooyackers(IMEC), M.J.H. van Dal(IMEC), R.J.P. Lander(NXP (Belgium)), R.G.R. Weemaes(Philips (Netherlands)), F. C. Voogt(NXP (Netherlands)), H. L. Roberts(NXP (Netherlands))
Cited by 32
Related Papers
Low-Loss SOI Photonic Wires and Ring Resonators Fabricated With Deep UV Lithography
|IEEE Photonics Technology Letters|2004|430
Compact Wavelength-Selective Functions in Silicon-on-Insulator Photonic Wires
|IEEE Journal of Selected Topics in Quantum Electronics|2006|338
Three-Dimensional Observation of the Conductive Filament in Nanoscaled Resistive Memory Devices
|Nano Letters|2014|338
Germanium MOSFET Devices: Advances in Materials Understanding, Process Development, and Electrical Performance
|Journal of The Electrochemical Society|2008|267