Scaling of high-k dielectrics towards sub-1nm EOT
Marc Heyns(IMEC), D. Pique(Imec the Netherlands), Jan Willem Maes(ASM International (Belgium)), Shang‐Yi Lin(Imec the Netherlands), Luca Lucci(IMEC), J. Kluth(Imec the Netherlands), A. Kerber(Imec the Netherlands), Wei‐Chi Tsai(Imec the Netherlands), Werner Boullart(IMEC), G. Groeseneken(KU Leuven), Annelies Delabie(IMEC), L. Daté(Imec the Netherlands), T. Witters(IMEC), P. Bajolet(IMEC), Jörgen Westlinder(IMEC), T. Kauerauf(IMEC), Enoch Rufus Young(Imec the Netherlands), L. Pantisano(IMEC), Thierry Conard(IMEC), Wilfried Vandervorst(Imec the Netherlands), Willy DeWeerdt(IMEC), Matty Caymax(IMEC), Pieter Blomme(IMEC), E. Röhr(IMEC), J. Mentens(IMEC), G.S. Lujan(IMEC), Soo-Ik Jang(Imec the Netherlands), R. Degraeve(IMEC), Bert Brijs(IMEC), Stefan De Gendt(Imec the Netherlands), E. Cartier(IBM (United States)), H. Bender(IMEC), J. Pétry(Service Public Fédéral Économie), K. Henson(Imec the Netherlands), V. Cosnier(Imec the Netherlands), Patrick Van Doorne(IMEC), J. Chen(Imec the Netherlands), Martine Claes(Imec the Netherlands), S. Beckx(Imec the Netherlands), Stefan Kubicek(Austrian Academy of Sciences), M. Green(Imec the Netherlands), Sven Van Elshocht(Columbia University), R. Carter(IMEC), Chao Zhao(IMEC), H. De Witte(KU Leuven), V. Kaushik(IMEC), Y. Manabe(IMEC), Olivier Richard(IMEC), Y. Shimamoto(IMEC), T. Schram(IMEC)
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