High-k dielectrics for future generation memory devices (Invited Paper)J. A. Kittl, Dirk J. Wouters, Thierry Conard et al.|Microelectronic Engineering|2009Cited by 252
Ternary rare-earth metal oxide high-k layers on silicon oxideChao Zhao, Darrell G. Schlom, T. Witters et al.|Applied Physics Letters|2005Cited by 133
Deposition of HfO2 on germanium and the impact of surface pretreatmentsSven Van Elshocht, Marc Heyns, Bert Brijs et al.|Applied Physics Letters|2004Cited by 106
Atomic layer deposition of hafnium oxide on germanium substratesAnnelies Delabie, Wilman Tsai, Riikka L. Puurunen et al.|Journal of Applied Physics|2005Cited by 101
Scaling to Sub-1 nm Equivalent Oxide Thickness with Hafnium Oxide Deposited by Atomic Layer DepositionAnnelies Delabie, Marc Heyns, Matty Caymax et al.|Journal of The Electrochemical Society|2006Cited by 49