Characterization of the VT Instability in SiO2/HfO2 Gate Dielectrics
A. Kerber(Infineon Technologies (Germany)), Udo Schwalke(Technische Universität Darmstadt), T. Kauerauf(IMEC), L. Pantisano(IMEC), R. Degraeve(IMEC), E. Cartier(IBM (United States)), G. Groeseneken(KU Leuven), H.E. Maes(IMEC), M. Rosmeulen(IMEC)
TUbilio (Technical University of Darmstadt)
April 4, 2003
Cited by 64
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