Characterization of the V/sub T/-instability in SiO/sub 2//HfO/sub 2/ gate dielectricsA. Kerber, Udo Schwalke, E. Cartier et al.|Unknown|2003Cited by 92
Characterization of the VT Instability in SiO2/HfO2 Gate DielectricsA. Kerber, Udo Schwalke, M. Rosmeulen et al.|TUbilio (Technical University of Darmstadt)|2003Cited by 64
Direct measurement of the inversion charge in MOSFETs: application to mobility extraction in alternative gate dielectricsA. Kerber, G. Groeseneken, E. Cartier et al.|Unknown|2004Cited by 32
Dynamics of threshold voltage instability in stacked high-k dielectrics: role of the interfacial oxideL. Pantisano, H.E. Maes, E. Cartier et al.|Unknown|2004Cited by 21
Ni-based FUSI gates: CMOS Integration for 45nm node and beyondThomas Hoffmann, J. A. Kittl, A. Veloso et al.|Unknown|2006Cited by 16