Charge Trapping and Dielectric Reliability of SiO2/Al2O3 Gate Stacks with TiN Electrodes
A. Kerber(Infineon Technologies (Germany)), Udo Schwalke(Technische Universität Darmstadt), L. Pantisano(IMEC), R. Degraeve(IMEC), E. Cartier(IBM (United States)), Philippe Roussel(IMEC), G. Groeseneken(KU Leuven), H.E. Maes(IMEC), T. Kauerauf(IMEC)
Microelectronic Engineering
January 1, 2003
Cited by 54
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