Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling succession
T. Chiarella(IMEC), Thomas Hoffmann(IMEC), S. Biesemans(IMEC), A. Redolfi(IMEC), A. Lauwers(IMEC), A. Mercha(IMEC), S. Brus(University of Liège), C. Vrancken(IMEC), A. De Keersgieter(IMEC), Liesbeth Witters(IMEC), C. Ortolland(IMEC), P. Absil(IMEC), Stefan Kubicek(Austrian Academy of Sciences), Michał Rakowski(IMEC), Bertrand Parvais(IMEC), C. Kerner(IMEC)
Cited by 120
Related Papers
Consistent model for short-channel nMOSFET after hard gate oxide breakdown
|IEEE Transactions on Electron Devices|2002|166