Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling successionT. Chiarella, Thomas Hoffmann, Liesbeth Witters et al.|Solid-State Electronics|2010Cited by 120
Enabling the high-performance InGaAs/Ge CMOS: a common gate stack solutionDennis Lin, Thomas Hoffmann, Guy Brammertz et al.|Unknown|2009Cited by 60
High FET Performance for a Future CMOS $\hbox{GeO}_{2}$ -Based TechnologyFlorence Bellenger, Marc Heyns, Brice De Jaeger et al.|IEEE Electron Device Letters|2010Cited by 51
Gate-last vs. gate-first technology for aggressively scaled EOT logic/RF CMOSA. Veloso, Thomas Hoffmann, L.-Å. Ragnarsson et al.|Symposium on VLSI Technology|2011Cited by 31
Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?T. Chiarella, Thomas Hoffmann, S. Brus et al.|Unknown|2009Cited by 27