Benchmarking SOI and bulk FinFET alternatives for PLANAR CMOS scaling successionT. Chiarella, Thomas Hoffmann, Liesbeth Witters et al.|Solid-State Electronics|2010Cited by 120
Migrating from planar to FinFET for further CMOS scaling: SOI or bulk?T. Chiarella, Thomas Hoffmann, Bertrand Parvais et al.|Unknown|2009Cited by 27
Low V<inf>T</inf> CMOS using doped Hf-based oxides, TaC-based Metals and Laser-only AnnealS. Kubicek, S. Biesemans, T. Schram et al.|Unknown|2007Cited by 18
Ni-based FUSI gates: CMOS Integration for 45nm node and beyondThomas Hoffmann, J. A. Kittl, A. Veloso et al.|Unknown|2006Cited by 16
Migrating from planar to FinFET for further CMOS scaling: SOI or Bulk?T. Chiarella, Thomas Hoffmann, Liesbeth Witters et al.|Unknown|2009Cited by 14