Metal Inserted Poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration
R. Singanamalla(IMEC), R.J.P. Lander(NXP (Belgium)), S. Locorotondo(IMEC), Denis Shamiryan(IMEC), M. Demand(IMEC), C.A.H. Juffermans(NXP (Belgium)), Patrick Jaenen(IMEC), J.C. Hooker(NXP (Belgium)), H.Y. Yu(IMEC), S. Beckx(Imec the Netherlands), M.J.H. van Dal(IMEC), S. Kubicek(IMEC), K. De Meyer(IMEC), S. Biesemans(IMEC)
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