High-k dielectrics for future generation memory devices (Invited Paper)
J. A. Kittl(IMEC), Dirk J. Wouters(IMEC), Johan Swerts(IMEC), Sergiu Clima(IMEC), Johan Meersschaut(IMEC), Annelies Delabie(IMEC), M. Jurczak(IMEC), Dieter Pierreux(ASM International (Belgium)), Tom Blomberg(ASM International (Finland)), W. Polspoel(IMEC), D. Manger(Imec the Netherlands), Marc Schaekers(IMEC), Christophe Detavernier(Ghent University Hospital), Jan Van Houdt(KU Leuven), Thierry Conard(IMEC), Karl Opsomer(IMEC), Wilfried Vandervorst(Imec the Netherlands), N. Menou(IMEC), Paola Favia(IMEC), Alexis Franquet(IMEC), B. Kaczer(IMEC), R. Degraeve(IMEC), Christoph Adelmann(Imec the Netherlands), Bert Brijs(IMEC), B. Govoreanu(IMEC), H. Bender(IMEC), Małgorzata Pawlak(IMEC), Geoffrey Pourtois(IMEC), X. P. Wang(IMEC), A. Rothschild(IMEC), Pamela R. Fischer(ASM International (Belgium)), Kazuyuki Tomida(IMEC), W. Knaepen(Ghent University), Sven Van Elshocht(Columbia University), M. Zahid(IMEC), Jan Willem Maes(ASM International (Belgium)), V. V. Afanas’ev(IMEC), M. Popovici(IMEC)
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