Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μmJ. E. Bjorkholm, John H. Bruning, Jeffrey Bokor et al.|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1990Cited by 160
Reflective mask technologies and imaging results in soft x-ray projection lithographyD. M. Tennant, Alastair A. MacDowell, J. E. Bjorkholm et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1991Cited by 23
Mask technologies for soft-x-ray projection lithography at 13 nmD. M. Tennant, O. R. Wood, Linus A. Fetter et al.|Applied Optics|1993Cited by 14
20:1 projection soft x-ray lithography using trilevel resistT. E. Jewell, John H. Bruning, Marco Becker et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1990Cited by 14
Soft-x-ray projection lithography experiments using Schwarzschild imaging opticsDaniel A. Tichenor, David L. Windt, Glenn D. Kubiak et al.|Applied Optics|1993Cited by 12