Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μmJ. E. Bjorkholm, John H. Bruning, Jeffrey Bokor et al.|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1990Cited by 160
Diffraction-limited soft-x-ray projection imaging using a laser plasma sourceDaniel A. Tichenor, L. A. Brown, T. E. Jewell et al.|Optics Letters|1991Cited by 44
Phase-measuring interferometry using extreme ultraviolet radiationJ. E. Bjorkholm, D. M. Tennant, Alastair A. MacDowell et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1995Cited by 32
High resolution germanium zone plates and apertures for soft x-ray focalometryD. M. Tennant, R. W. Epworth, E. L. Raab et al.|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1990Cited by 28
Reflective mask technologies and imaging results in soft x-ray projection lithographyD. M. Tennant, Alastair A. MacDowell, J. E. Bjorkholm et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1991Cited by 23