Reflective mask technologies and imaging results in soft x-ray projection lithography
D. M. Tennant(University of Tennessee at Knoxville), Alastair A. MacDowell(AT&T (United States)), L. H. Szeto(AT&T (United States)), Raissa M. D’Souza(Santa Fe Institute), L. Eichner(AT&T (United States)), R. R. Freeman(AT&T (United States)), T. E. Jewell(AT&T (United States)), David L. Windt(Reflective X Ray Optics), W. K. Waskiewicz(AT&T (United States)), J. E. Bjorkholm(AT&T (United States)), O. R. Wood(AT&T (United States)), W Mansfield(AT&T (United States)), D. L. White(AT&T (United States)), J. Pastalan(AT&T (United States))
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
November 1, 1991
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