Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μmJ. E. Bjorkholm, John H. Bruning, Jeffrey Bokor et al.|Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena|1990Cited by 160
Phase-measuring interferometry using extreme ultraviolet radiationJ. E. Bjorkholm, D. M. Tennant, Alastair A. MacDowell et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1995Cited by 32
Reflective mask technologies and imaging results in soft x-ray projection lithographyD. M. Tennant, Alastair A. MacDowell, J. E. Bjorkholm et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1991Cited by 23
Mask technologies for soft-x-ray projection lithography at 13 nmD. M. Tennant, O. R. Wood, Linus A. Fetter et al.|Applied Optics|1993Cited by 14
Characterization of AZ PN114 resist for high resolution using electron-beam and soft-x-ray projection lithographiesK. Early, O. R. Wood, D. M. Tennant et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1992Cited by 14