Mask technologies for soft-x-ray projection lithography at 13 nm

D. M. Tennant(University of Tennessee at Knoxville), O. R. Wood(AT&T (United States)), David L. Windt(Reflective X Ray Optics), W. K. Waskiewicz(AT&T (United States)), P. P. Mulgrew(AT&T (United States)), Linus A. Fetter, J. Pastalan(AT&T (United States)), L. R. Harriott(AT&T (United States)), Alastair A. MacDowell(AT&T (United States))

Applied Optics

December 1, 1993

10.1364/ao.32.007007

Cited by 14

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