Phase-measuring interferometry using extreme ultraviolet radiationJ. E. Bjorkholm, D. M. Tennant, Alastair A. MacDowell et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1995Cited by 32
Reflective mask technologies and imaging results in soft x-ray projection lithographyD. M. Tennant, Alastair A. MacDowell, W. K. Waskiewicz et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1991Cited by 23
Characterization of AZ PN114 resist for high resolution using electron-beam and soft-x-ray projection lithographiesK. Early, O. R. Wood, D. M. Tennant et al.|Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena|1992Cited by 14
Mask technologies for soft-x-ray projection lithography at 13 nmD. M. Tennant, O. R. Wood, Linus A. Fetter et al.|Applied Optics|1993Cited by 14
20:1 projection soft x-ray lithography using trilevel resistT. E. Jewell, John H. Bruning, Marco Becker et al.|Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE|1990Cited by 14