Reduction imaging at 14 nm using multilayer-coated optics: Printing of features smaller than 0.1 μm
J. E. Bjorkholm(AT&T (United States)), John H. Bruning, L. H. Szeto(AT&T (United States)), Jeffrey Bokor(Berkeley College), L. Eichner(AT&T (United States)), A. A. Mac Dowell(Rutherford Appleton Laboratory), R. R. Freeman(AT&T (United States)), T. E. Jewell(AT&T (United States)), David L. Windt(Reflective X Ray Optics), W. K. Waskiewicz(AT&T (United States)), D. M. Tennant(University of Tennessee at Knoxville), W. T. Silfvast(AT&T (United States)), O. R. Wood(AT&T (United States)), D. L. White(AT&T (United States)), W Mansfield(AT&T (United States)), J. Greguš(AT&T (United States)), E. L. Raab(AT&T (United States))
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
November 1, 1990
Cited by 160