Addressing Key Challenges for SiGe-pFin Technologies: Fin Integrity, Low-DIT Si-Cap-Free Gate Stack and Optimizing the Channel Strain
Hiroaki Arimura(IMEC), Naoto Horiguchi(IMEC), S. Brus(University of Liège), E. Capogreco(IMEC), Paola Favia(IMEC), L.-Å. Ragnarsson(IMEC), H. Bender(IMEC), S. Baudot(IMEC), Geert Eneman(Research Foundation - Flanders), A. Peter(IMEC), Kurt Wostyn(IMEC), Olivier Richard(IMEC), Jérôme Mitard(IMEC), T. Schram(IMEC)
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