Demonstration of phase-controlled Ni-FUSI CMOSFETs employing SiON dielectrics capped with sub-monolayer ALD HfSiON for low power applications
H.Y. Yu(IMEC), S. Biesemans(IMEC), A. Lauwers(IMEC), S. Brus(University of Liège), Thomas Hoffmann(IMEC), C. Vrancken(IMEC), A. Veloso(IMEC), P. Absil(IMEC), R. Singanamalla(IMEC), Shou-Zen Chang(IMEC), C. Kerner(IMEC), Jean-Luc Everaert, Annelies Delabie(IMEC)
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