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Demonstration of phase-controlled Ni-FUSI CMOSFETs employing SiON dielectrics capped with sub-monolayer ALD HfSiON for low power applicationsH.Y. Yu, S. Biesemans, Shou-Zen Chang et al.|Unknown|2007Cited by 0
Threshold voltage control in polysilicon or fully-silicided-Hf-based gate dielectric pMOSFETs using controlled lateral oxidationVidya Kaushik, Marc Heyns, Olivier Richard et al.|ECS Transactions|2005Cited by 0
Threshold Voltage Control in PMOSFETs with Polysilicon or Fully-Silicided Gates on Hf-based gate dielectric using Controlled Lateral OxidationVidya Kaushik, Marc Heyns, E. Röhr et al.|ECS Meeting Abstracts|2006Cited by 0