Island growth in the atomic layer deposition of zirconium oxide and aluminum oxide on hydrogen-terminated silicon: Growth mode modeling and transmission electron microscopy
Riikka L. Puurunen(Aalto University), M. Tuominen(ASM International (Belgium)), Toon de Win(Philips (Netherlands)), M. Kaiser(Philips (Netherlands)), Annelies Delabie(IMEC), Hidde H. Brongersma, Thierry Conard(IMEC), Y. Tamminga(Philips (Netherlands)), Marcel A. Verheijen(Philips (Netherlands)), Wilfried Vandervorst(Imec the Netherlands), Matty Caymax(IMEC), Marc Heyns(IMEC), W.F.A. Besling(Philips (France)), Stefan De Gendt(Imec the Netherlands), H. Bender(IMEC), M. Viitanen, Chao Zhao(Chinese Academy of Sciences), Thuy Xuan Huynh Dao(Philips (Netherlands)), M. de Ridder(Philips (India)), Olivier Richard(IMEC)
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