Cost-effective cleaning and high-quality thin gate oxides
Marc Heyns(IMEC), K. Wolke(STEAG (Germany)), G. Groeseneken(KU Leuven), Conny Kenens(IMEC), Rita Vos(IMEC), Marc Schaekers(IMEC), Wilfried Vandervorst(Imec the Netherlands), Ivo Teerlinck(IMEC), R. Degraeve(IMEC), Lee M. Loewenstein(Texas Instruments (United States)), Ingrid Cornelissen(IMEC), Twan Bearda(IMEC), S. Mertens(IMEC), D. Martin Knotter(Philips (Netherlands)), Marc Meuris(IMEC), Paul Mertens(IMEC), S. DeGendt(IMEC), T. Nigam(IMEC)
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