Cost-effective cleaning and high-quality thin gate oxidesMarc Heyns, K. Wolke, R. Degraeve et al.|IBM Journal of Research and Development|1999Cited by 48
Effect of an in-Situ H2 Plasma Pretreatment on the Minority Carrier lifetime of a-Si:H(i) Passivated Crystalline SiliconS.N. Granata, Robert Mertens, Twan Bearda et al.|Energy Procedia|2012Cited by 30