Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development

S. Beckx(Imec the Netherlands), B. Coenegrachts(Lam Research (Austria)), S. Biesemans(IMEC), S. Locorotondo(IMEC), Vasile Paraschiv(IMEC), Denis Shamiryan(IMEC), M. Demand(IMEC), S. Vanhaelemeersch(Imec the Netherlands), Patrick Jaenen(IMEC), K. Henson(Imec the Netherlands), Martine Claes(Imec the Netherlands), Johan Vertommen(Lam Research (Austria)), S. DeGendt(IMEC), Werner Boullart(IMEC)
Microelectronics Reliability
January 25, 2005
10.1016/j.microrel.2004.11.005
Cited by 12

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