On the scalability of source/drain current enhancement in thin film sSOI
E. Augendre(IMEC), S. Biesemans(IMEC), S. Locorotondo(IMEC), M. Jurczak(IMEC), Bartek Pawlak(NXP (Belgium)), Erik Sleeckx(IMEC), S. Brus(University of Liège), J. Ramos(IMEC), Frederik Leys(IMEC), A. De Keersgieter(IMEC), M. Ercken(IMEC), Veerle Simons(IMEC), Ingrid De Wolf(IMEC), Geert Eneman(Research Foundation - Flanders), S. Severi(IMEC), M. W. Goodwin(Texas Instruments (United States)), M. Seacrist(SunEdison (United States)), L. Fei(SunEdison (United States)), Jean‐François de Marneffe(IMEC), K. De Meyer(IMEC), B. K. Kellerman(SunEdison (United States))
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