Characterization of AZ PN114 resist for high resolution using electron-beam and soft-x-ray projection lithographies

K. Early(AT&T (United States)), O. R. Wood(AT&T (United States)), Alastair A. MacDowell(AT&T (United States)), D. M. Tennant(University of Tennessee at Knoxville), Dae‐Young Jeon(AT&T (United States)), P. P. Mulgrew(AT&T (United States))

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

November 1, 1992

10.1116/1.586334

Cited by 14

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