Impact of EOT scaling down to 0.85nm on 70nm Ge-pFETs technology with STI
Jérôme Mitard(IMEC), Marc Heyns(IMEC), Evi Vrancken(IMEC), Jason Lin(Apellis Pharmaceuticals (United States)), Michel Houssa(IMEC), A. Stesmans(KU Leuven), L. Pantisano(IMEC), Frederik Leys(IMEC), A. Pristera(University of Calabria), Gillis Winderickx(IMEC), Matty Caymax(IMEC), G. Wang(IMEC), W.E. Wang(Intel (United States)), Geert Hellings(IMEC), Kristin DeMeyer(IMEC), Geert Eneman(Research Foundation - Flanders), Marc Meuris(IMEC), Roger Loo(IMEC), B. DeJaeger(IMEC), Christopher G. Shea(Rochester Institute of Technology)
Symposium on VLSI Technology
June 1, 2006
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