Channel hot-carrier degradation in pMOS and nMOS short channel transistors with high-k dielectric stack
E. Amat(Universitat Autònoma de Barcelona), G. Groeseneken(KU Leuven), X. Aymerich(Vall d'Hebron Hospital Universitari), R. Rodrı́guez(Universitat Autònoma de Barcelona), R. Degraeve(IMEC), T. Kauerauf(IMEC), M. Nafrı́a(Universitat Autònoma de Barcelona)
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