Challenges in using optical lithography for the building of a 22nm node 6T-SRAM cell
Monique Ercken(IMEC), Staf Verhaegen(IMEC), S. Brus(University of Liège), M. Demand(IMEC), Christie Delvaux(IMEC), Efrain Altamirano Sánchez, S. Locorotondo(IMEC), Kris Baert(Ghent University), A. Veloso(IMEC), T. Vandeweyer(IMEC), Naoto Horiguchi(IMEC), Johan De Backer(IMEC)
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