Scalability of Ni FUSI gate processes: phase and Vt control to 30 nm gate lenghts
J. A. Kittl(IMEC), S. Baesmans(Imec the Netherlands), M. Jurczak(IMEC), C. Demeurisse(Imec the Netherlands), S. Brus(University of Liège), A. Lauwers, C. Vrancken(IMEC), M. Niwa, Małgorzata Pawlak(IMEC), A. Veloso(IMEC), T. Chiarelia(Imec the Netherlands), K.G. Anil(IMEC), Karen Maex(IMEC), Olivier Richard(IMEC), M.J.H. van Dal(IMEC), S. Kubicek(IMEC)
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