Towards understanding degradation and breakdown of SiO/sub 2//high-k stacks
T. Kauerauf(IMEC), G. Groeseneken(KU Leuven), Pieter Blomme(IMEC), B. Kaczer(IMEC), R. Degraeve(IMEC), B. Govoreanu(IMEC), E. Cartier(IBM (United States)), A. Kerber(Infineon Technologies (Germany)), L. Pantisano(IMEC)
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