Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputteringRuijiang Hong, Andreas Pflug, V. Sittinger et al.|Applied Surface Science|2003Cited by 99
Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputteringBernd Szyszka, A. Lopp, Xin Jiang et al.|Thin Solid Films|2003Cited by 68
Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputteringRuijiang Hong, Wolfgang Werner, Xin Jiang et al.|Journal of Crystal Growth|2003Cited by 40
Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputteringRuijiang Hong, G. Heide, Xin Jiang et al.|Journal of Crystal Growth|2003Cited by 38
Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputteringRuijiang Hong, G.H. Frischat, Xin Jiang et al.|Journal of Vacuum Science & Technology A Vacuum Surfaces and Films|2002Cited by 12