Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputtering
Ruijiang Hong(Kunming University of Science and Technology), Wolfgang Werner(TU Wien), Bernd Szyszka(Fraunhofer Institute for Surface Engineering and Thin Films), G. Heide(Clausthal University of Technology), V. Sittinger(Fraunhofer Institute for Surface Engineering and Thin Films), Xin Jiang(Inner Mongolia University of Technology)
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