Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering
Bernd Szyszka(Fraunhofer Institute for Surface Engineering and Thin Films), A. Lopp(Siemens (Germany)), M. Ruske(Siemens (Germany)), Wolfgang Werner(TU Wien), V. Sittinger(Fraunhofer Institute for Surface Engineering and Thin Films), Andreas Pflug(Fraunhofer Institute for Surface Engineering and Thin Films), Xin Jiang(Inner Mongolia University of Technology), Ruijiang Hong(Kunming University of Science and Technology)
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