Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputtering

Ruijiang Hong(Kunming University of Science and Technology), G. Heide(Clausthal University of Technology), V. Sittinger(Fraunhofer Institute for Surface Engineering and Thin Films), Xin Jiang(Inner Mongolia University of Technology), Shanhui Xu(Center for High Pressure Science & Technology Advanced Research), Wolfgang Werner(TU Wien), Bernd Szyszka(Fraunhofer Institute for Surface Engineering and Thin Films)
Journal of Crystal Growth
May 13, 2003
Cited by 38


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