Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputteringRuijiang Hong, Andreas Pflug, Xin Jiang et al.|Applied Surface Science|2003Cited by 99
Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputteringBernd Szyszka, A. Lopp, Xin Jiang et al.|Thin Solid Films|2003Cited by 68
Texture analysis of Al-doped ZnO thin films prepared by in-line reactive MF magnetron sputteringRuijiang Hong, Bernd Szyszka, K. Helming et al.|Applied Surface Science|2003Cited by 41
Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputteringRuijiang Hong, Wolfgang Werner, Xin Jiang et al.|Journal of Crystal Growth|2003Cited by 40
Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputteringRuijiang Hong, G. Heide, Xin Jiang et al.|Journal of Crystal Growth|2003Cited by 38