Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputteringRuijiang Hong, Wolfgang Werner, Xin Jiang et al.|Journal of Crystal Growth|2003Cited by 40
Comparison of the ZnO:Al films deposited in static and dynamic modes by reactive mid-frequency magnetron sputteringRuijiang Hong, G. Heide, V. Sittinger et al.|Journal of Crystal Growth|2003Cited by 38
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