Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering
Ruijiang Hong(Kunming University of Science and Technology), Andreas Pflug(Fraunhofer Institute for Surface Engineering and Thin Films), Bernd Szyszka(Fraunhofer Institute for Surface Engineering and Thin Films), V. Sittinger(Fraunhofer Institute for Surface Engineering and Thin Films), Xin Jiang(Inner Mongolia University of Technology)
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