Uniformity in large area ZnO:Al films prepared by reactive midfrequency magnetron sputtering
Ruijiang Hong(Kunming University of Science and Technology), G.H. Frischat(Clausthal University of Technology), Bernd Szyszka(Fraunhofer Institute for Surface Engineering and Thin Films), V. Sittinger(Fraunhofer Institute for Surface Engineering and Thin Films), Xin Jiang(Inner Mongolia University of Technology), T. Höing(Fraunhofer Institute for Surface Engineering and Thin Films), G. Heide(Clausthal University of Technology)
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