Thermal annealing effects on the structural and electrical properties of HfO2/Al2O3 gate dielectric stacks grown by atomic layer deposition on Si substratesMoonju Cho, Jongho Lee, Hong Bae Park et al.|Journal of Applied Physics|2003Cited by 91
Channel Hot Carrier Degradation Mechanism in Long/Short Channel $n$-FinFETsMoonju Cho, G. Groeseneken, Philippe Roussel et al.|IEEE Transactions on Electron Devices|2013Cited by 90
Insight Into N/PBTI Mechanisms in Sub-1-nm-EOT DevicesMoonju Cho, G. Groeseneken, Lars‐Åke Ragnarsson et al.|IEEE Transactions on Electron Devices|2012Cited by 90
Positive and negative bias temperature instability on sub-nanometer eot high-K MOSFETsMoonju Cho, G. Groeseneken, M. Aoulaiche et al.|Unknown|2010Cited by 32
A consistent model for oxide trap profiling with the Trap Spectroscopy by Charge Injection and Sensing (TSCIS) techniqueMoonju Cho, G. Groeseneken, R. Degraeve et al.|Solid-State Electronics|2010Cited by 26