Low temperature source/drain epitaxy and functional silicides: essentials for ultimate contact scaling
Clément Porret(IMEC), Naoto Horiguchi(IMEC), Roger Loo(IMEC), Michael Givens(ASM International (Belgium)), J. Swerts(IMEC), Hans Mertens(IMEC), Erik Rosseel(IMEC), S. Brus(University of Liège), Andriy Hikavyy(IMEC), Marc Schaekers(IMEC), E. Dentoni Litta(IMEC), M. Korytov(IMEC), D. Batuk(IMEC), Paola Favia(IMEC), C. Toledo De Carvalho Cavalcante(IMEC), Gunther Sterckx(IMEC), N. Heylen(IMEC), Geoffrey Pourtois(IMEC), Gianluca Rengo(IMEC), S. Mertens(IMEC), Xiaoyu Piao(IMEC), R. Langer(IMEC), Lars‐Åke Ragnarsson(IMEC), Ankit Nalin Mehta(IMEC), J.-L. Everaert(IMEC), Rami Khazaka(ASM International (Belgium))
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