Selective wet removal of Hf-based layers and post-dry etch residues high-k and metal gate
Martine Claes(Imec the Netherlands), Stefan De Gendt(Imec the Netherlands), Sylvain Garaud, Rita Vos(IMEC), Vasile Paraschiv(IMEC), M. Demand(IMEC), Harald Kraus, S. Beckx(Imec the Netherlands), Werner Boullart(IMEC), Jim Snow, W. Deweerd(IMEC)
Unknown
January 1, 2004
Cited by 0
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